During the last month, Samsung had to pay the whopping amount of $538.6 million to Apple due to some patents infringement that is related to the design of iPhone. Now, Samsung is being punished once again for using the intellectual property of another company without proper licensing.
The jury of U.S exposed a new suit for patent infringement of a specific technology that is related to the FinFET architecture. The related technology belongs to KAIST IP US (Korea Advanced Institue of Science and Technology) and for infringing patents, the South-Korean owes about $400 million to the technology firm. However, the jury of US ruled that Samsung willfully infringed the patent, and for that reason, the court decided to triple the amount to $1.2 billion. Worth noting, that alongside Samsung, Qualcomm and GlobalFoundries Inc, were also caught for infringing the same patent, however, the pair managed to escape without being ordered to pay damages.
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If you’re unaware, FinFET is a transistor that is used in the design of processors that use gate electrodes shaped like a fin. The technology in question allows multiple gates to open on a single transistor, allowing for a much-improved performance and less power consuming on smaller chipsets. According to the complaint judged by the United States court, Samsung dismissed the use of FinFET at first but changed its mind when Intel licensed FinFET for its chipsets. Samsung has denied the patent infringement, stating that it worked with the University to develop FinFET. The South-Korean king of smartphones, also added that it believes that the patent is invalid and will consider an appeal to the jury.
